Seed shape dependence of Si solid-phase epitaxy: Preferential facet growth
Murakami, Eiichi, Moniwa, Masahiro, Kusukawa, Kikuo, Miyao, Masanobu, Warabisako, Terunori, Wada, YasuoVolume:
63
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.340442
File:
PDF, 713 KB
english, 1988