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Ion-implantation in bulk semi-insulating 4H–SiC
Rao, Mulpuri V., Tucker, Jesse B., Ridgway, M. C., Holland, O. W., Papanicolaou, N., Mittereder, J.Volume:
86
Year:
1999
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.370799
File:
PDF, 536 KB
english, 1999