Ion-implantation in bulk semi-insulating 4H–SiC

Rao, Mulpuri V., Tucker, Jesse B., Ridgway, M. C., Holland, O. W., Papanicolaou, N., Mittereder, J.

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Volume:

Year:

1999

Language:

english

Journal:

Journal of Applied Physics

DOI:

10.1063/1.370799

File:

PDF, 536 KB

english, 1999

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