Feature-scale model of Si etching in SF[sub 6]∕O[sub 2]...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2005 Vol. 23; Iss. 5

Feature-scale model of Si etching in SF[sub 6]∕O[sub 2] plasma and comparison with experiments

Belen, Rodolfo Jun, Gomez, Sergi, Cooperberg, David, Kiehlbauch, Mark, Aydil, Eray S.
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Volume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2013317
File:
PDF, 577 KB
english, 2005
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