Codiffusion of arsenic and phosphorus implanted in silicon

Codiffusion of arsenic and phosphorus implanted in silicon

Solmi, S., Maccagnani, P., Canteri, R.
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Volume:
74
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.354306
File:
PDF, 1.27 MB
english, 1993
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