Effect of oxygen on fluorine-based remote plasma etching of...

Effect of oxygen on fluorine-based remote plasma etching of silicon and silicon dioxide

Loewenstein, Lee M.
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Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575221
Date:
May, 1988
File:
PDF, 676 KB
english, 1988
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