Range profiles of 600–1200 keV Xe+ implanted in KTiOPO4

Journal of Applied Physics 1994 Vol. 76; Iss. 4

Range profiles of 600–1200 keV Xe+ implanted in KTiOPO4

Wang, Ke-Ming, Ding, Pei-Jun, Wang, Wei, Lanford, W. A., Shi, Bo-Rong, Yu, Zheng-Gang, Lu, Qing-Ming
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Volume:
76
Year:
1994
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.357621
File:
PDF, 761 KB
english, 1994
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