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SiH[sub x] film growth precursors during high-rate nanocrystalline silicon deposition
Kessels, W. M. M., Nadir, K., van de Sanden, M. C. M.Volume:
99
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2188068
File:
PDF, 291 KB
english, 2006