Growth kinetics of thermal silicon oxynitridation in nitric...

Growth kinetics of thermal silicon oxynitridation in nitric oxide ambient

Dasgupta, Anindya, Takoudis, Christos G.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
93
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1555705
File:
PDF, 431 KB
english, 2003
Conversion to is in progress
Conversion to is failed