Ion-to-CH[sub 3] flux ratio in diamond chemical-vapor...

Journal of Applied Physics 2002 Vol. 92; Iss. 7

Ion-to-CH[sub 3] flux ratio in diamond chemical-vapor deposition

Teii, Kungen, Hori, Masaru, Goto, Toshio
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Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1506384
File:
PDF, 313 KB
english, 2002
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