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Reactive ion etching of GaAs in CCl4−xFx (x=0, 2, 4) and mixed CCl4−xFx/Ar discharges
Klinger, R. E., Greene, J. E.Volume:
54
Year:
1983
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.332143
File:
PDF, 998 KB
english, 1983