a-Si:H thin film microstructure influenced by HOMOCVD-process parameters
A. Toneva, Bl. Pantchev, P. DaneshVolume:
31
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0927-0248(93)90061-7
File:
PDF, 314 KB
english, 1993