Lateral spread effects in the implantation of Ar+, Xe+, and...

Journal of Applied Physics 1992 Vol. 72; Iss. 9

Lateral spread effects in the implantation of Ar+, Xe+, and Hg+ in Si3N4 films

Wang, Ke-Ming, Qu, Bao-Dong, Shi, Bo-Rong, Wang, Zhong-Lie, Liu, Xiang-Dong, Liu, Ji-Tian, Zhao, Qing-Tai
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Volume:
72
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.352252
File:
PDF, 692 KB
english, 1992
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