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50 nm gate electrode patterning using a neutral-beam etching system
Noda, Shuichi, Nishimori, Hirotomo, Ida, Tohru, Arikado, Tsunetoshi, Ichiki, Katsunori, Ozaki, Takuya, Samukawa, SeijiVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1723338
File:
PDF, 680 KB
english, 2004