![](/img/cover-not-exists.png)
Thickness determination of very thin SiO[sub 2] films on Si by electron-induced x-ray emission spectroscopy
Hombourger, C., Jonnard, P., Filatova, E. O., Lukyanov, V.Volume:
81
Year:
2002
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1511281
File:
PDF, 294 KB
english, 2002