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Fabrication of high-quality strain-relaxed thin SiGe layers on ion-implanted Si substrates
K. Sawano, S. Koh, Y. Shiraki, Y. Ozawa, T. Hattori, J. Yamanaka, K. Suzuki, K. Arimoto, K. Nakagawa, N. UsamiYear:
2004
Language:
english
DOI:
10.1063/1.1794353
File:
PDF, 390 KB
english, 2004