![](/img/cover-not-exists.png)
Fluorine implantation for effective work function control in p-type metal-oxide-semiconductor high-k metal gate stacks
A. Fet, V. Häublein, A. J. Bauer, H. Ryssel, L. FreyYear:
2011
Language:
english
DOI:
10.1116/1.3521471
File:
PDF, 857 KB
english, 2011