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Microloading effect in ultrafine SiO[sub 2] hole/trench etching
Y. Feurprier, Y. Chinzei, M. Ogata, T. Kikuchi, M. Ozawa, T. Ichiki, Y. HoriikeYear:
1999
Language:
english
DOI:
10.1116/1.581852
File:
PDF, 574 KB
english, 1999