Direct ion beam deposition of carbon films on silicon in...

Direct ion beam deposition of carbon films on silicon in the ion energy range of 15–500 eV

Lau, W. M., Bello, I., Feng, X., Huang, L. J., Fuguang, Qin, Zhenyu, Yao, Zhizhang, Ren, Lee, S.-T.

How much do you like this book?

What’s the quality of the file?

Download the book for quality assessment

What’s the quality of the downloaded files?

Volume:

Year:

1991

Language:

english

Journal:

Journal of Applied Physics

DOI:

10.1063/1.350177

File:

PDF, 1.01 MB

english, 1991

Conversion to is in progress

Conversion to is failed