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Diffusion of paramagnetic defects in amorphous silicon

Diffusion of paramagnetic defects in amorphous silicon

Jackson, W. B., Tsai, C. C., Thompson, R.
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Volume:
64
Language:
english
Journal:
Physical Review Letters
DOI:
10.1103/PhysRevLett.64.56
Date:
January, 1990
File:
PDF, 669 KB
english, 1990
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