Anisotropic deposition of Cu in trenches by H-assisted...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2004 Vol. 22; Iss. 4

Anisotropic deposition of Cu in trenches by H-assisted plasma chemical vapor deposition

Takenaka, Kosuke, Kita, Makoto, Kinoshita, Toshio, Koga, Kazunori, Shiratani, Masaharu, Watanabe, Yukio
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Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1738663
File:
PDF, 595 KB
english, 2004
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