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Etching mechanism of MgO thin films in inductively coupled Cl[sub 2]∕Ar plasma
Efremov, A. M., Koo, Seong-Mo, Kim, Dong-Pyo, Kim, Kyoung-Tae, Kim, Chang-IlVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1772370
File:
PDF, 366 KB
english, 2004