Prediction of UV spectra and UV-radiation damage in actual plasma etching processes using on-wafer monitoring technique
Jinnai, Butsurin, Fukuda, Seiichi, Ohtake, Hiroto, Samukawa, SeijiVolume:
107
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3313924
File:
PDF, 421 KB
english, 2010