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Etching of (Ba,Sr)TiO[sub 3] film by chlorine plasma
Shibano, Teruo, Takenaga, Takashi, Nakamura, Keisuke, Oomori, TatsuoVolume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1286026
File:
PDF, 529 KB
english, 2000