Anisotropic plasma etching of polymers using a cryo-cooled resist mask
Schüppert, B., Brose, E., Petermann, K., Moosburger, R.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582197
File:
PDF, 418 KB
english, 2000