Modeling the breakdown spots in silicon dioxide films as...

Applied Physics Letters 1999 Vol. 75; Iss. 7

Modeling the breakdown spots in silicon dioxide films as point contacts

Suñé, J., Miranda, E., Nafría, M., Aymerich, X.
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Volume:
75
Year:
1999
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.124566
File:
PDF, 294 KB
english, 1999
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