Study of reactive-ion-etch-induced lattice damage in...

Study of reactive-ion-etch-induced lattice damage in silicon by Ar, CF4, NF3, and CHF3 plasmas

Connick, I-Wen H., Bhattacharyya, Anjan, Ritz, Kenneth N., Smith, W. Lee
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Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341713
File:
PDF, 892 KB
english, 1988
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