Study of reactive-ion-etch-induced lattice damage in silicon by Ar, CF4, NF3, and CHF3 plasmas
Connick, I-Wen H., Bhattacharyya, Anjan, Ritz, Kenneth N., Smith, W. LeeVolume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341713
File:
PDF, 892 KB
english, 1988