Two-step rapid thermal annealing of B- and As-implanted...

Journal of Applied Physics 1992 Vol. 71; Iss. 1

Two-step rapid thermal annealing of B- and As-implanted polycrystalline silicon films

Sicart, J., Jeanjean, P., Sellitto, P., Robert, J. L., Chaussemy, G., Laugier, A.
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Volume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.350699
File:
PDF, 700 KB
english, 1992
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