Chemical interaction between atomic-layer-deposited HfO[sub 2] thin films and the Si substrate
Cho, Moonju, Park, Jaehoo, Park, Hong Bae, Hwang, Cheol Seong, Jeong, Jaehack, Hyun, Kwang SooVolume:
81
Year:
2002
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.1492320
File:
PDF, 562 KB
english, 2002