A chemical mechanical planarization model for aluminum gate...

Microelectronic Engineering 2015 / 01 Vol. 131

A chemical mechanical planarization model for aluminum gate structures

Xu, Qinzhi, Chen, Lan, Fang, Jingjing, Yang, Fei
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Volume:
131
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.09.023
Date:
January, 2015
File:
PDF, 870 KB
english, 2015
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