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Optimum structure of deposited ultrathin silicon oxynitride film to minimize leakage current
Muraoka, K., Kurihara, K., Yasuda, N., Satake, H.Volume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1588354
File:
PDF, 772 KB
english, 2003