Summary Abstract: Desorption dynamics of SiF4 etch product

Summary Abstract: Desorption dynamics of SiF4 etch product

Houle, F. A.
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Volume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.575084
Date:
May, 1988
File:
PDF, 434 KB
english, 1988
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