Improved accuracy in monitoring Si monolayer incorporation...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1998 / 5 Vol. 16; Iss. 3

Improved accuracy in monitoring Si monolayer incorporation in GaAs during molecular beam epitaxy

Däweritz, L.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581205
Date:
May, 1998
File:
PDF, 1024 KB
english, 1998
Conversion to is in progress
Conversion to is failed