On dose correction in electron beam lithography

Journal of Applied Physics 1988 Vol. 64; Iss. 1

On dose correction in electron beam lithography

Deshmukh, P. R., Khokle, W. S.
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Volume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341445
File:
PDF, 547 KB
english, 1988
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