Material properties of low pressure chemical vapor...

Material properties of low pressure chemical vapor deposited silicon nitride for modeling and calibrating the simulation of advanced isolation structures

Smeys, Peter I. L., Griffin, Peter B., Saraswat, Krishna C.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360084
File:
PDF, 961 KB
english, 1995
Conversion to is in progress
Conversion to is failed