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Material properties of low pressure chemical vapor deposited silicon nitride for modeling and calibrating the simulation of advanced isolation structures
Smeys, Peter I. L., Griffin, Peter B., Saraswat, Krishna C.Volume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360084
File:
PDF, 961 KB
english, 1995