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Structure of surface reaction layer of poly-Si etched by fluorocarbon plasma
Kurihara, Kazuaki, Egami, Akihiko, Nakamura, MoritakaVolume:
24
Year:
2006
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.2167972
File:
PDF, 520 KB
english, 2006