![](/img/cover-not-exists.png)
Critical layer thickness in metal organic chemical vapor deposition grown InGaAs/GaAs strained quantum wells
Zhang, Xiaobo, Briot, Olivier, Gil, Bernard, Aulombard, RogerVolume:
78
Year:
1995
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.360695
File:
PDF, 540 KB
english, 1995