Computational model of reactive sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1993 / 05 Vol. 11; Iss. 3

Computational model of reactive sputtering

Koss, V. A., Ioffe, I. V., Belkind, A.
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Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.578794
Date:
May, 1993
File:
PDF, 460 KB
english, 1993
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