Charging damage to gate oxides in an O2 magnetron plasma

Journal of Applied Physics 1992 Vol. 72; Iss. 10

Charging damage to gate oxides in an O2 magnetron plasma

Fang, Sychyi, McVittie, James P.
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Volume:
72
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.352051
File:
PDF, 1.16 MB
english, 1992
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