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Solid-phase crystallization behaviors of in situ phosphorous-doped amorphous silicon films deposited using Si[sub 2]H[sub 6] and PH[sub 3]
Yokoyama, Shigeyuki, Onizuka, Hisayuki, Yoshizawa, Yuki, Kuwano, HiroshiVolume:
94
Year:
2003
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1582234
File:
PDF, 293 KB
english, 2003