Characterization of oxygen impurity concentration in silicon based on thermal emission measurements
V.K. Malyutenko, V.I. Chernyakovsky, T. PiotrowskiVolume:
37
Year:
1996
Language:
english
Pages:
6
DOI:
10.1016/1350-4495(95)00077-1
File:
PDF, 437 KB
english, 1996