In-situ optimization of coupling between semiconductor...

Journal of Applied Physics 1990 Vol. 68; Iss. 7

In-situ optimization of coupling between semiconductor claddings and dielectric waveguides

Veasey, David L., Larson, Donald R., Batchman, Theodore E.
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Volume:
68
Year:
1990
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.346293
File:
PDF, 503 KB
english, 1990
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