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Reactive etching of platinum-manganese using a pulse-time-modulated chlorine plasma and a H[sub 2] plasma post-etch corrosion treatment
Kumagai, Shinya, Shiraiwa, Toshiaki, Samukawa, SeijiVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1738656
File:
PDF, 1.35 MB
english, 2004