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The preparation of in situ doped hydrogenated amorphous silicon by homogeneous chemical vapor deposition
Meyerson, B. S., Scott, B. A., Wolford, D. J.Volume:
54
Year:
1983
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.332172
File:
PDF, 622 KB
english, 1983