Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 3
![](/img/cover-not-exists.png)
Nucleation and growth characteristics of electroplated Cu on plasma enhanced atomic layer deposition-grown RuTaN direct plate barriers
Chakraborty, Tonmoy, Greenslit, Daniel, Eisenbraun, Eric T.Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3585664
File:
PDF, 1.35 MB
english, 2011