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Liquid silicide formation on the Si wafer free surface during Ni diffusion at 1200 °C
Li, Jianxing, Yang, Woun-Suck, Tan, Teh Y., Chevacharoenkul, Sopa, Chapman, RichardVolume:
71
Year:
1992
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.350736
File:
PDF, 1.42 MB
english, 1992