Reactive-environment, hollow cathode sputtering: Basic...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2004 Vol. 22; Iss. 4

Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al[sub 2]O[sub 3], doped ZnO, and In[sub 2]O[sub 3]:Mo

Delahoy, A. E., Guo, S. Y., Paduraru, C., Belkind, A.
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Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1723289
File:
PDF, 364 KB
english, 2004
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