[IEEE 2011 IEEE 4th International Nanoelectronics Conference (INEC) - Tao-Yuan, Taiwan (2011.06.21-2011.06.24)] The 4th IEEE International NanoElectronics Conference - A simple method for forming sub-30 nm gate patterns with modified I-line double patterning technique
Tsai, Tzu-I, Chao, Tien-Sheng, Lin, Horng-Chih, Huang, Tiao-Yuan, Lin, Horng-Chih, Wei, Yun-JieYear:
2011
Language:
english
DOI:
10.1109/inec.2011.5991710
File:
PDF, 910 KB
english, 2011