Modeling of epitaxial silicon growth from the SiH2Cl2-H2-HCl system in an rf-heated pancake reactor
Oh, In-Hwan, Takoudis, Christos G.Volume:
69
Year:
1991
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.347446
File:
PDF, 1.31 MB
english, 1991