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Etching studies of silica glasses in SF[sub 6]/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication
Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M.-C., Rhallabi, A.Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3298875
File:
PDF, 768 KB
english, 2010