Electrical and structural properties of rapid thermally...

Electrical and structural properties of rapid thermally annealed boron-doped silicon films deposited by plasma-enhanced chemical-vapor deposition

Jeanjean, P., Sicart, J., Sellitto, P., Robert, J. L., Bustarret, E., Grieshaber, W., Cali, J., Le Berre, M., Lemiti, M., Pinard, P., Conedera, V.

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Volume:

Year:

1994

Language:

english

Journal:

Journal of Applied Physics

DOI:

10.1063/1.357306

File:

PDF, 978 KB

english, 1994

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